| 摘要 |
PURPOSE:To obtain a symbol rapidly and easily without causing contamination of a wafer by a method wherein a small incoming light is made incident to a reduced lens through a small window provided in a reticle, while the reduced image of the window is focused upon a blank marking portion of a wafer and a desired recognition symbol is drawn by controlling the position of a XY shifting stand. CONSTITUTION:A wafer 6 for drawing a recognition symbol is mounted through an adhesion stand 8 on a XY shifting stand 10, and a light from a light source provided over the wafer 6 is projected upon a lens 2 by operating a large size shutter 20. Subseqently, a light from the lens 2 is projected upon a reticle 3 having a chrome pattern 4 provided thereon to transcribe the pattern 4 to a resist film 7 on the surface of the wafer 6. On the other hand, a small light source 14 is provided in the side face of an equipment, the light from the light source 14 is incident upon a transparent window 18 provided in the reticle 3 through a rotary shielding shutter 16, a light fiber 15 and a flat mirror 17, while the light from the window 18 is projected through a reduced lens 5 upon the making portion of the wafer 6, thereby a small window reduced image 19 is formed and the drawing is performed by shifting the shifting stand 10. |
