发明名称 Applicator for thin liq. films - uses flow of gas over moving substrate to apply an even layer, one micrometer thick
摘要 <p>This device applies a thin layer of liquid, such as photo-sensitive emulsion, to a substrate, such as glass, metal or plastics. The layer can be as thin as one micron and its thickness does not vary with ridges or other surface features of the substrate. The device has applications in the construction of micro-electronic circuit elements. The substrate is mounted on a turntable which revolves at 10,000 r.p.m., and drops of liquid are applied to the substrate surface. An assembly, which delivers gas through a 25 micron slit, makes use of the laminar flow of liquid across a moving horizontal surface to distribute the liquid in an even layer and to remove the excess liquid.</p>
申请公布号 NL8101440(A) 申请公布日期 1982.10.18
申请号 NL19810001440 申请日期 1981.03.23
申请人 EDWARD BOK, BURGEMEESTER AMERSFOORDTLAAN 82 TE 1171 DR BADHOEVEDORP. 发明人
分类号 G03F7/16;(IPC1-7):05C5/02;03C1/74 主分类号 G03F7/16
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