发明名称 Method for enhancing electron mobility in GaAs
摘要 The electron mobility in an active layer on a semi-insulating substrate is enhanced by initially performing a high energy implantation of an element which is inert in the semi-insulating material. Donor ions are then implanted so as to form the active layer in that area of the substrate in which the high energy implantation was performed, and the substrate is annealed.
申请公布号 US4383869(A) 申请公布日期 1983.05.17
申请号 US19810273303 申请日期 1981.06.15
申请人 RCA CORPORATION 发明人 LIU, SHING-GONG
分类号 H01L21/265;(IPC1-7):H01L21/26 主分类号 H01L21/265
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