| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam deposition device in which a film forming part is scarcely damaged even when a crucible is brought close to a substrate, and in addition, even when a magnet for shielding reflected electrons is provided between the substrate and the crucible, there is no interference between the magnet and a deflecting magnet for leading electron beams to the inside of the crucible.SOLUTION: An electron beam deposition device forms a thin film by depositing a material 12 heated and vaporized by irradiation of accelerated electrons to the surface of a substrate 17. An electron gun 13 for accelerating electrons emitted at a predetermined voltage at least to the material 12 in the crucible 14 in which the material 12 is charged, and a deflecting magnet 16 for leading the electron beams emitted from the electron gun 13 to the inside of the crucible are disposed obliquely relative to the substrate 17 so that the deflecting magnet 16 is distant from the substrate 17 and the crucible 14 is close to the substrate 17, and electrons are irradiated obliquely from above to the material 12 in the crucible. Proximity vapor deposition can be achieved, and this can meet the needs of film deposition at a higher deposition rate. |
