发明名称 Pattern transfer with self-assembled nanoparticle assemblies
摘要 In one aspect, a method comprises: providing a substrate having at least one layer in which the patterned dot array is to be fabricated; depositing a nanoparticle layer, wherein the nanoparticle layer comprises one or more surfactants and nanoparticles coated with the one or more surfactants; treating the one or more surfactants that coat the nanoparticles and the portions of the one or more surfactants that fill the spaces among the nanoparticles; removing the portions of the one or more surfactants that fill the spaces among the nanoparticles to expose portions of the at least one layer in which the patterned dot array is to be fabricated; etching the exposed portions of the at least one layer in which the patterned dot array is to be fabricated; and removing at least a portion of the nanoparticles.
申请公布号 US9487869(B2) 申请公布日期 2016.11.08
申请号 US201313907716 申请日期 2013.05.31
申请人 Carnegie Mellon University 发明人 Majetich Sara;Wen Tianlong
分类号 C23F1/04;B05D3/14;G03F7/00;B82Y40/00 主分类号 C23F1/04
代理机构 Fish & Richardson P.C. 代理人 Fish & Richardson P.C.
主权项 1. A method for fabricating a patterned dot array, the method comprising: providing a substrate having at least one layer in which the patterned dot array is to be fabricated; depositing, onto the at least one layer in which the patterned dot array is to be fabricated, a nanoparticle layer, wherein the nanoparticle layer comprises one or more surfactants and nanoparticles, with the nanoparticles being coated with the one or more surfactants in the nanoparticle layer, and with portions of the one or more surfactants filling spaces among the nanoparticles in the nanoparticle layer; treating the one or more surfactants that coat the nanoparticles and the portions of the one or more surfactants that fill the spaces among the nanoparticles to stabilize positions of the nanoparticles on the at least one layer in which the patterned dot array is to be fabricated; removing, from the nanoparticle layer, the portions of the one or more surfactants that fill the spaces among the nanoparticles to expose portions of the at least one layer in which the patterned dot array is to be fabricated; etching the exposed portions of the at least one layer in which the patterned dot array is to be fabricated; and removing at least a portion of the nanoparticles.
地址 Pittsburgh PA US