发明名称 Radiation sensitive coating composition
摘要 A radiation sensitive coating composition comprising (a) an alkali soluble resin such as a phenolic resin, poly(p-vinylphenol) or a halogenated poly(p-vinylphenol), (b) poly(2-methylpentene-1-sulfone), and (c) a solvent containing isoamyl acetate as major component can give a positive-type radiation sensitive resist film with good compatibility of the resin components and other good properties.
申请公布号 US4409317(A) 申请公布日期 1983.10.11
申请号 US19820420878 申请日期 1982.09.21
申请人 HITACHI, LTD. 发明人 SHIRAISHI, HIROSHI
分类号 G21K4/00;G03C1/00;G03F7/039;H01L21/027;(IPC1-7):G03C1/68 主分类号 G21K4/00
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