发明名称 ATOMIC LAYER GROWTH DEVICE
摘要 The present invention is provided with an injector that is attached at a film-formation container opening and with an injector adhesion-prevention material that is inserted into and attached at the opening. An injector raw-material-gas supply path, an injector raw-material-gas supply port, an injector reactant-gas supply path, an injector reactant-gas supply port, an injector inactive-gas supply path, and an injector inactive-gas supply port are demarcated and provided to the injector. An adhesion-prevention material raw-material-gas supply path, an adhesion-prevention material raw-material-gas supply port, an adhesion-prevention material reactant-gas supply path, an adhesion-prevention material reactant-gas supply port, an adhesion-prevention material inactive-gas supply path, and an adhesion-prevention material inactive-gas supply port are demarcated and provided to the injector adhesion-prevention material. The adhesion-prevention material inactive-gas supply path is provided to a gap between an outer-circumferential side of the injector adhesion-prevention material and an inner-circumferential side of the opening such that an inactive gas flows therethrough.
申请公布号 WO2016190004(A1) 申请公布日期 2016.12.01
申请号 WO2016JP62399 申请日期 2016.04.19
申请人 THE JAPAN STEEL WORKS,LTD. 发明人 MATSUMOTO Tatsuya;WASHIO Keisuke
分类号 C23C16/44;C23C16/455;H01L21/31 主分类号 C23C16/44
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