发明名称 FLUORINE-CONTAINING POLYAMIC ACIDS AND POLYIMIDES
摘要 <p>Polyimides represented by general formula (I), (wherein Ar1 and Ar2 each represents an aromatic ring-containing group, Cf represents a fluorinated alkyl group directly bound to Ar1, and m &gt; 1), and polyamic acids as their percursors. The polyimides have excellent humidity resistance and heat resistance, thus being useful as coating materials for semiconductor chips and insulating films for multi-layered wiring. </p>
申请公布号 WO1984004102(P1) 申请公布日期 1984.10.25
申请号 JP1984000182 申请日期 1984.04.11
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