| 摘要 |
<p>A sputtering target supporting device for fixing, to a common electrode (5), a plurality of beams (1, 2) forming a mosaic target used for co-sputtering. At least one pressing mechanism (4b) is provided exclusively for each of the beams (1, 2) to press the respective beam (1, 2) against the common electrode (5) by means of the respective pressing mechanism (4b) provided therefor. </p> |
