发明名称 Method for manufacturing boron-free silicon dioxide
摘要 The invention provides a method for manufacturing boron-free SiO2 by purification of hexafluorosilicic acid. In this case, an aqueous solution of the boron-containing hexafluorosilicic acid is transferred to the organic phase by treatment with organic compounds immiscible with water and subsequently the organic phase is converted to boron-free hexafluorosilicic acid by means of fluid-fluid extraction in the alkaline or acid medium. Particularly, complex-forming compounds, such as tri-iso-octylamine, and organic solvents, such as xylol, are used as organic compounds. The method produces SiO2 with a boron content of less than 1 ppm and is usable for manufacturing silicon for solar cells.
申请公布号 US4505883(A) 申请公布日期 1985.03.19
申请号 US19830555267 申请日期 1983.11.25
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 VITE, LUTZ;MEWS, HANNELORE
分类号 C01B33/18;(IPC1-7):C01B33/12 主分类号 C01B33/18
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