发明名称 |
Method for manufacturing boron-free silicon dioxide |
摘要 |
The invention provides a method for manufacturing boron-free SiO2 by purification of hexafluorosilicic acid. In this case, an aqueous solution of the boron-containing hexafluorosilicic acid is transferred to the organic phase by treatment with organic compounds immiscible with water and subsequently the organic phase is converted to boron-free hexafluorosilicic acid by means of fluid-fluid extraction in the alkaline or acid medium. Particularly, complex-forming compounds, such as tri-iso-octylamine, and organic solvents, such as xylol, are used as organic compounds. The method produces SiO2 with a boron content of less than 1 ppm and is usable for manufacturing silicon for solar cells.
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申请公布号 |
US4505883(A) |
申请公布日期 |
1985.03.19 |
申请号 |
US19830555267 |
申请日期 |
1983.11.25 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
VITE, LUTZ;MEWS, HANNELORE |
分类号 |
C01B33/18;(IPC1-7):C01B33/12 |
主分类号 |
C01B33/18 |
代理机构 |
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主权项 |
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地址 |
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