| 摘要 |
A process for selectively depositing a tungsten or tantalum refractory metal on a graphite piece, particularly for X-ray tube anodes, wherein the graphite piece is masked on selected surfaces, an intermediate layer of a coating material is deposited on unmasked surfaces to promote adhesion of the refractory metal followed by removal of the masking and deposition of the refractory metal on all surfaces, and finally removing from the formerly masked surfaces refractory metal poorly adhered thereto.
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