发明名称 |
Dentifrice silica base prepn. - comprises silica deposition and neutralisation with set chloride or sulphuric acid ion addn. rates |
摘要 |
<p>SiO2 base for dentifrice has a refractive index of 1.42-1.45 and a specific surface area of 5-60 m2/g. as determined by the BET or 17ABmethod,thedifferenceinthevaluesdeterminedbythese methods being not more than 40 m2/g. In prepn. alkali metal silicate soln. is reacted with HCl or sulphuric acid in the presence of an electrolyte in a process comprising (i) SiO2 deposition with the reaction system pH at up to 10.0; and (ii) a neutralisation step in which the reaction system pH is 8.0-6.5 and the ratio of the Cl or sulphuric acid ion addn. rate to the addn. rate in SiO2 deposition is at least 5:3, and which is effected in 10-30 min.</p> |
申请公布号 |
NL8402626(A) |
申请公布日期 |
1986.03.17 |
申请号 |
NL19840002626 |
申请日期 |
1984.08.29 |
申请人 |
TAKI CHEMICAL CO., LTD. TE KAKOGAWA, JAPAN. |
发明人 |
|
分类号 |
A61K8/25;A61Q11/00;C01B33/193;(IPC1-7):C01B33/193;A61K7/16 |
主分类号 |
A61K8/25 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|