| 摘要 |
Apparatus for the continuous electrodeposition of metals at high current density in vertical cells, wherein the body to be plated, usually metal strip, follows first a descending path and then an ascending one, during both of which it traverses at least one electrolytic deposition cell through which is passed an electrolyte in turbulent flow regime, moving in the opposite direction in the descending stretch to that in the ascending stretch, so that in both stretches the fluid dynamic conditions are very uniform.
|
