发明名称 CMOS integrated circuit
摘要 A CMOS integrated circuit includes a P-channel type MOS transistor which is formed on an N-type silicon substrate, an N-channel type MOS transistor which is formed on a P well formed in the substrate, and parasitic bipolar transistors which are electrically connected to each other to form a kind of thyristor structure. A power supply voltage is applied to a source electrode of the P-channel type MOS transistor through a part of the substrate which presents a resistance. The resistance is electrically connected to the parasitic bipolar transistor of the thyristor structure to thereby prevent the occurrence of a latch-up phenomenon in which a large current continuously flows through the parasitic bipolar transistors and may destroy the CMOS integrated circuit. Because of the prevention of the latch-up phenomenon, the CMOS integrated circuit is always maintained in good condition.
申请公布号 US4672584(A) 申请公布日期 1987.06.09
申请号 US19850691701 申请日期 1985.01.15
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 TSUJI, KAZUHIKO;YAMAGUCHI, SEIJI;ICHINOHE, EISUKE
分类号 H01L21/74;H01L21/822;H01L27/04;H01L27/08;H01L27/092;H01L29/78;(IPC1-7):H01L27/02 主分类号 H01L21/74
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