METHOD OF DEPOSITING A LAYER OF EXTREMELY HARD CHROMIUM ON A SUBSTRATE

摘要

By cathode sputtering in a reactive environment, a coating of a solid solution of chromium and an element such as nitrogen, carbon, phosphorus, boron or silicon is deposited. The content of the above element is higher than the saturation limit of the solid solution in chromium. It ranges between Tm=0.2% and TM=3% by weight for carbon and between Tm=0.04% and TM=3.5% by weight for nitrogen.