ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS

摘要

A film layer comprising a high-chi (χ) block copolymer for self-assembly and a surface active polymer (SAP) was prepared on a substrate surface that was neutral wetting to the domains of the self-assembled block copolymer. The block copolymer comprises at least one polycarbonate block and at least one other block (e.g., a styrene-based block). The SAP comprises a hydrophobic fluorinated first repeat unit and a non-fluorinated second repeat unit bearing at least one pendent OH group present as an alcohol or acid (e.g., carboxylic acid). The film layer, whose top surface has contact with an atmosphere, self-assembles to form a lamellar or cylindrical domain pattern having perpendicular orientation with respect to the underlying surface. Other morphologies (e.g., islands and holes of height 1.0Lo) were obtained with films lacking the SAP. The SAP is preferentially miscible with, and lowers the surface energy of, the domain comprising the polycarbonate block.

主权项

1. A composition, comprising:
i) a solvent; ii) a block copolymer comprising:
a) a first block comprising a repeat unit of formula (B-1):wherein I) Rw is a monovalent radical selected from the group consisting of H, methyl, ethyl, and trifluoromethyl (*—CF3) and II) Rd is a monovalent radical comprising an aromatic ring linked to carbon 1, and
b) an aliphatic polycarbonate second block (polycarbonate block) linked to the first block; and iii) a surface active polymer (SAP), comprising:
about 40 mol % to about 90 mol %, based on total moles of monomers used to prepare the SAP, of a fluorinated repeat unit (first repeat unit), wherein the first repeat unit has a chemical structure having no functionality capable of donating a hydrogen to form a hydrogen bond,about 10 mol % to about 60 mol %, based on total moles of monomers used to prepare the SAP, of a non-fluorinated second repeat unit comprising a functional group selected from the group consisting of alcohols, carboxylic acids, phosphonic acids, and sulfonic acids;wherein
the block copolymer and the SAP are dissolved in the solvent.