发明名称 GAAS SINGLE CRYSTAL AND PREPARATION THEREOF
摘要 A GaAs single crystal is disclosed containing at least one impurity selected from the group consisting of In, Al, C and S, in which fluctuation of the concentration of the impurity is less that 20% throughout the crystal from which wafers having uniform characteristics can be produced, and which may be prepared by a process comprising, at a high temperature and under high pressure, pulling up the single crystal from a raw material melt containing simple substances Ga and As or GaAs compound as well as at least one impurity while controlling the concentration of As so as to keep a distribution coefficient of the impurity in GaAs within 1+/-0.1.
申请公布号 EP0149082(B1) 申请公布日期 1988.02.24
申请号 EP19840114530 申请日期 1984.11.30
申请人 SUMITOMO ELECTRIC INDUSTRIES LIMITED 发明人 SHIMODA, TAKASHI C/O ITAMI WORKS OF SUMITOMO;SASAKI, MASAMI C/O ITAMI WORKS OF SUMITOMO
分类号 C30B15/04;C30B15/00;C30B27/02;C30B29/42 主分类号 C30B15/04
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