发明名称 Molecular beam source
摘要 A molecular beam source suppresses a temperature fall at the opening of a crucible, to make a temperature distribution within the crucible uniform and to prevent the phenomenon of bumping of a source substance, whereby the quality of an evaporated film can be enhanced. The source includes a heater disposed around the crucible which is formed of straight parts and U-shaped end parts continuously repeated at equal intervals. The straight parts are arranged so as to extend in a vertical direction of the crucible and the U-shaped end parts are bent outwards at outer-peripheral positions of the opening of the crucible.
申请公布号 US4748315(A) 申请公布日期 1988.05.31
申请号 US19870005846 申请日期 1987.01.21
申请人 HITACHI, LTD. 发明人 TAKAHASHI, KUNIHIRO;FUJIOKA, KAZUMASA;TAMURA, NAOYUKI
分类号 H01L21/203;C23C14/24;C23C14/26;C30B23/00;F27D99/00;H05B3/64;(IPC1-7):C23C14/26 主分类号 H01L21/203
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