发明名称 |
Molecular beam source |
摘要 |
A molecular beam source suppresses a temperature fall at the opening of a crucible, to make a temperature distribution within the crucible uniform and to prevent the phenomenon of bumping of a source substance, whereby the quality of an evaporated film can be enhanced. The source includes a heater disposed around the crucible which is formed of straight parts and U-shaped end parts continuously repeated at equal intervals. The straight parts are arranged so as to extend in a vertical direction of the crucible and the U-shaped end parts are bent outwards at outer-peripheral positions of the opening of the crucible.
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申请公布号 |
US4748315(A) |
申请公布日期 |
1988.05.31 |
申请号 |
US19870005846 |
申请日期 |
1987.01.21 |
申请人 |
HITACHI, LTD. |
发明人 |
TAKAHASHI, KUNIHIRO;FUJIOKA, KAZUMASA;TAMURA, NAOYUKI |
分类号 |
H01L21/203;C23C14/24;C23C14/26;C30B23/00;F27D99/00;H05B3/64;(IPC1-7):C23C14/26 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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