| 摘要 |
An electron beam metrology system for measuring the width of a pattern on a surface of a sample in such a manner that the surface of the sample is scanned with an electron beam, secondary electrons emitted from the surface are detected to obtain a detection signal, and the width of the pattern is measured by using the detection signal, is disclosed in which a pair of detectors are disposed symmetrically with respect to the optical axis of the electron beam in a scanning direction thereof, a ratio of one of the output signals of the detectors to the other output signal and a ratio of the other output signal to the one output signal are formed, and a sum signal indicative of the sum of two ratios is produced, to be used for measuring the width of the pattern correctly and accurately, without being affected by a change in pattern material.
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