Resin and photoresist composition comprising the same

摘要

The present invention provides a resin comprising a structural unit represented by the formula (aa):;
wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents *-X2—, *-X2—X4—CO—X3—, or *-X2—CO—X4—X3—, X2 and X3 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rc)—, * represents a binding position to X1, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

主权项

1. A resin comprising a structural unit represented by the formula (aa): wherein T1 represents a group represented by the formula (T1): wherein X11, X12 and X13 independently each represent —O—, —S— or —CH2—, one or two hydrogen atoms in —CH2— in the formula (T1) may be replaced by a halogen atom, a hydroxyl group, a cyano group, C1-C12 alkyl group optionally having a halogen atom or a hydroxyl group, a C1-C12 alkoxy group, C6-C12 aryl group, a C7-C12 aralkyl group, a glycidyloxy group, a C2-C12 alkoxycarbonyl group or a C2-C4 acyl group, and * represents a binding position to —O—, in the formula (aa), X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents a C1-C6 alkanediyl group and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.