Solution of silicon in a metal, coating process and silicon thin film obtainable in accordance with the process
摘要
A method is described for coating a material surface with a silicon thin film, silicon being dissolved in a metallic solution and the dissolved silicon then being precipitated from the solution in a temperature range in which a silicon layer is formed on the metal surface. The solvent is a mixture of gold and a metal or metals which either have a melting point which is below the deposition temperature range or which, together with gold, form a eutectic which has a eutectic temperature which is below the deposition temperature range.
申请公布号
DE3908156(A1)
申请公布日期
1989.10.19
申请号
DE19893908156
申请日期
1989.03.13
申请人
UNISEARCH LTD., KENSINGTON, NEUSUEDWALES/NEW SOUTH WALES, AU
发明人
GREEN, MARTIN ANDREW, WAVERELY, NEW SOUTH WALES, AU;WENHAM, STUART ROSS, ILLAWONG, NEW SOUTH WALES, AU