| 摘要 |
A laminator (10) for applying photoresist dry film (52) to the opposite faces of panels comprises a supporting frame providing a laminating station (22) and a nip (90) located centrally w.r.t. station, a means for releasably suspending each successive predetermined lengths of film in the station above the nip, a supporting surface for holding a stack of panels in an upright position, a pick-up means for picking up and holding successive panels in upright position in line with the nip as each of lengths of film is suspended above the nip, and a device associated with the pick-up for moving each panel down into engagement with the film and into the nip. |
