FORMATION OF TUNGSTEN FILM BY SELECTIVE CVD PROCESS USING LIFT-OFF METHOD,申请号JP19880298103-传众专利搜索

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发明名称	FORMATION OF TUNGSTEN FILM BY SELECTIVE CVD PROCESS USING LIFT-OFF METHOD
摘要
申请公布号	JPH02144917(A)	申请公布日期	1990.06.04
申请号	JP19880298103	申请日期	1988.11.28
申请人	HITACHI LTD	发明人	SAKAI HIDEO
分类号	H01L21/3205	主分类号	H01L21/3205
代理机构		代理人
主权项
地址

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