发明名称 Surface etched shadow mask
摘要 A scratch reducing shadow mask for providing vapor deposition patterns of bonding metals onto a surface of a die. The shadow mask comprises a top surface and a bottom surface which define a plurality of vias for permitting vaporized bonding metals to pass through the mask. Mask bottom surface comprises a plurality of recessed regions to minimize the contact area of the mask with the die during the vapor deposition process.
申请公布号 US4980240(A) 申请公布日期 1990.12.25
申请号 US19890341637 申请日期 1989.04.20
申请人 HONEYWELL INC. 发明人 DUNAWAY, THOMAS J.;SPIELBERGER, RICHARD K.
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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