发明名称 |
Surface etched shadow mask |
摘要 |
A scratch reducing shadow mask for providing vapor deposition patterns of bonding metals onto a surface of a die. The shadow mask comprises a top surface and a bottom surface which define a plurality of vias for permitting vaporized bonding metals to pass through the mask. Mask bottom surface comprises a plurality of recessed regions to minimize the contact area of the mask with the die during the vapor deposition process.
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申请公布号 |
US4980240(A) |
申请公布日期 |
1990.12.25 |
申请号 |
US19890341637 |
申请日期 |
1989.04.20 |
申请人 |
HONEYWELL INC. |
发明人 |
DUNAWAY, THOMAS J.;SPIELBERGER, RICHARD K. |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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