| 发明名称 |
Base developable negative tone photoresist. |
| 摘要 |
Aqueous, base-soluble resist compositions useful for forming negative-tone images. More particularly, the compositions include an aromatic hydroxy-substituted polymeric composition, a radiation degradable acid generator which is adapted to absorb imaging radiation, and a cross-linking agent having at least 2 epoxy groups per molecule.
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| 申请公布号 |
EP0425418(A2) |
申请公布日期 |
1991.05.02 |
| 申请号 |
EP19900480149 |
申请日期 |
1990.09.21 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CONLEY, WILLARD EARL;MOREAU, WAYNE MARTIN;SPINILLO, GARY THOMAS;GELORME, JEFFREY DONALD;PERREAULT, STANLEY EUGENE;WOOD, ROBERT LAVIN |
| 分类号 |
G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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