发明名称 Photosensitive resin composition and method of forming conductive pattern.
摘要 <p>A photosensitive resin composition formed by dissolving a photosensitive resin and a metallic salt or a metal complex in a common solvent or by dispersing reduced metal colloid particles in a photosensitive resin. Also disclosed is a method of forming electrically conductive patterns by applying the photosensitive resin composition to a substrate, pre-baking the resin and then successively subjecting it to exposure, development and post-baking. The result is subjected to electroless plating, directly in the case of the photosensitive resin containing dispersed metal colloid particles, and after reducing the metallic salt or a metal complex to a metal in the case of the photosensitive resin composition containing a metallic salt or metal complex. The reduction of the metallic salt or metal complex is conducted after pre-baking or one of the ensuing steps.</p>
申请公布号 EP0453235(A2) 申请公布日期 1991.10.23
申请号 EP19910303374 申请日期 1991.04.16
申请人 NISSHINBO INDUSTRIES, INC. 发明人 SUZUKI, TOSHIO, C/O TOKYO RESEARCH CENTER;MARUTSUKA, TOSHINORI, C/O TOKYO RESEARCH CENTER
分类号 G03F7/00;G03F7/004;H05K3/18 主分类号 G03F7/00
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