GASIFICATION DEVICE, SUBSTRATE PROCESSING DEVICE AND SEMICONDUCTOR DEVICE PRODUCTION METHOD

摘要

[Problem] To provide a technique for generating stably a gasified gas in a liquid gasification process. [Solution] The gasification device comprises: a gasification container having an introduction port and an discharge port for a carrier gas; a dripping nozzle constituted in such a manner as to drip into a gasification container a liquid containing two or more substances whereof the boiling points inside the gasification container are different; a first gasification surface, which is horizontal or is inclined with respect to the horizontal, provided inside the gasification container at a dripping position of the liquid from the dripping nozzle; a heater for heating the first gasification surface; and an inclination angle adjustment mechanism for adjusting the inclination angle of the first gasification surface.