发明名称 PROCESS FOR PREPARING RADIATION SENSITIVE COMPOUND AND POSITIVE RESIST COMPOSITION
摘要 A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.
申请公布号 CA2065468(A1) 申请公布日期 1992.10.18
申请号 CA19922065468 申请日期 1992.04.07
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 TOMIOKA, JUN;KUWANA, KOJI;NAKANISHI, HIROTOSHI;TAKAGAKI, HIROSHI;DOI, YASUNORI;UETANI, YASUNORI;HANAWA, RYOTARO
分类号 C08G61/00;C07C303/28;C07C309/76;C07D311/60;G03F7/022;H01L21/027;(IPC1-7):C07D311/60 主分类号 C08G61/00
代理机构 代理人
主权项
地址