| 摘要 |
2102201 9221136 PCTABS00017 An electron cyclotron resonance plasma generator (24) is provided in a semiconductor wafer plasma processing apparatus and cluster tool module (10), particularly for use in soft etching. The generator (24) generates a uniform plasma by rotating a plasma producing resonance supporting magnetic field about the axis (56) of a resonance cavity (26) within the vacuum chamber (16) of a plasma processor. The rotated field preferably is a single-cusp or multicusp field produced by a magnet assembly (60), preferably formed of a cylindrical array of bar magnets (70), mounted to rotate about the outside of the wall (35) of the cavity (26). Gas uniformly flows into and through the cavity from a gas distribution shower (48). Microwave energy is evenly divided and coupled into the cavity in a TM01 mode by a plurality of axially and radially aligned loops (55).
|
