发明名称 PRODUCTION OF MULTIELEMENT COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING COPOLYMER AND PHOTOSENSITIVE ELEMENT USING THE SAME
摘要 PURPOSE:To obtain an almost rectangular copper circuit without contaminating a plating bath by incorporating vinyl monomers, photoinitiator and multielement copolymer obtd. by polymn. in the presence of a chain mobilizing agent having a specified structure. CONSTITUTION:A mixture soln. containing alpha, beta-unsatd. carboxylic acid and acrylate or methacrylate having alkyl groups of 1-20 carbon number is subjected to polymn. in the presence of a chain mobilizing agent expressed by formula I. In formula I, R1 is a group which makes an aromatic hydrocarbon condensed with an imidazole ring in formula, R2 is H, Na, K or -CH2-N-(R3)2, R3 is an alkyl group of 1-10 carbon number. The alpha, beta-unsatd. carboxylic acid gives developing property to a weak alkali soln., and is for example, acrylic acid. This unstad. carboxylie acid is preferably incorporated by 5-40wt.% of the total amt. for preparation of the multielement copolymer.
申请公布号 JPH055989(A) 申请公布日期 1993.01.14
申请号 JP19910144675 申请日期 1991.06.17
申请人 HITACHI CHEM CO LTD 发明人 ICHIKAWA TATSUYA;MINAMI YOSHITAKA;KAMAKURA YUICHI
分类号 C08F22/10;C08F220/10;G03F7/027;G03F7/031;G03F7/033;H01L21/027;H05K3/06 主分类号 C08F22/10
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