发明名称 |
IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD |
摘要 |
Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2. |
申请公布号 |
SG11201607890S(A) |
申请公布日期 |
2016.10.28 |
申请号 |
SG11201607890S |
申请日期 |
2015.04.07 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
CHOI, BYUNG-JIN;CHERALA, ANSHUMAN;YE, ZHENGMAO;LU, XIAOMING;LUO, KANG;KAWAHARA, NOBUTO;MIYAJIMA, YOSHIKAZU |
分类号 |
H01L21/027;B29C59/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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