| 摘要 |
PURPOSE:To improve mechanical strength by depositing an insulator by evaporation under irradiation with the ions or molecules of O2 or Ar or the mixture composed thereof, thereby forming a fiber layer. CONSTITUTION:The surface of an LiNbO3 substrate 9 imposed on a substrate gripping means 8 is irradiated with SiO2 or Al2O3 under irradiation with the ions or molecules of the the O2 or the mixture composed of the Ar an the O2 by simultaneously using an electron gun 1 for vapor deposition of a material for vapor deposition, such as SiO2 or Al2O3 and an electron gun 2 of an ion assist system, by which the insulating layer is formed in the prescribed position. These treatments are executed in a vacuum chamber 5. The formed substrate 9 and the formed buffer layer are monitored by an optical monitor 3 and a crystal monitor 4 and the formation of the fine buffer layer is executed under control by a computer 7. |
