| 摘要 |
PURPOSE:To provide a high withstand voltage insulator having a good water repellency, a good contamination resistance, and a high reliability with which dielectric breakdown is less likely to occur by forming a film of chemical adsorp tion monomolecular film including fluorine through siloxane coupling on the surface of an insulator of ceramic. CONSTITUTION:Hydrophilic OH-radicals 12 and SiCl4 on the surface of an insulator 11 are reacted for dehydrochlorination to fix the molecules to the surface through SiO coupling. Next, material including carbon fluoride radicals and chlorosilane radicals, that is CF3(CF2)7(CH2)2SiCl3, for example, is diluted and dissolved in nonaquaous solution, and the insulator 11 which is preprocessed as above is immersed in it. A monomolecular film 14 including fluorine is thus formed on the surface of the insulator at a film thickness of about 15Angstrom chemically coupled with a lower-layer siloxane monomolecular film 13.
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