SHADOW MASK HALL ARRANGEMENT METHOD

摘要

The method arranges the shadow mask holes located at the boundary part of effective screen area to improve the picture quality. The holes (3) are separated to even and odd columns. The vertical pitch (pvo) of the odd column being apart as much as X from the center line has relationship of Pvo = [2*sqrt(R2-X2)-R+m /n. The vertical pitch (Pve) of the even column has relationship of Pve = [2*sqrt(R2-X2)-R+m /(n+1) where R is the curve ratio of the effective boundary part of the shadow-mask, m is the length between the center and the boundary part of the maximum effective screen, and n is the number of holes of the odd column.