发明名称 |
Depletion controlled isolation stage. |
摘要 |
<p>An input protection device is presented having a depletion controlled isolation stage. In one embodiment of the invention, a depletion controlled isolation resistor (10) is formed between adjacent N+ diffused regions (16 and 18) by N-well diffusion. One N+ diffused region (16) electrically contacts an input bond pad (20) and a primary protective device. The other N+ diffused region (18) electrically contacts a second protective device and the internal circuit (21) it is to protect. The depletion controlled isolation resistor limits the amount of current passing through the resistor to a safe level during an over-voltage condition. In another embodiment of the invention, a depletion controlled isolation stage includes a silicon controlled rectifier (SCR) as the primary protective device in combination with the depletion controlled isolation resistor. <IMAGE></p> |
申请公布号 |
EP0535536(A1) |
申请公布日期 |
1993.04.07 |
申请号 |
EP19920116375 |
申请日期 |
1992.09.24 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
ROUNTREE, ROBERT;DUVVURY, CHARVAKA;MAKI, TATSUROH |
分类号 |
H01L21/761;H01L27/02;H01L27/06 |
主分类号 |
H01L21/761 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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