发明名称 FORMING METHOD FOR PHOTOSENSITIVE COMPOSITION AND PATTERN USING THE COMPOSITION
摘要 PURPOSE:To increase sensitivity with a photo-cross linking agent and polyvinyl alcohol. CONSTITUTION:A photosensitive polymer containing at least one kind of monomer unit selected from among maleic acid, azide group as a water-soluble, photo-nonsensitive monomer unit, vinylazide benzylideneacetophenone sulfonic acid, vinylazide benzylideneacetophenone carboxylic acid, vinylazide cinnamylidenacetophenone sulfonic acid, vinylazide cinnamylidenacetophenone carboxylic acid, and their salts is used as a photo-cross linking agent, and polyvinyl alcohol of a water-soluble polymer is used as a base polymer to manufacture a photosensitive composition.
申请公布号 JPH05197141(A) 申请公布日期 1993.08.06
申请号 JP19920009802 申请日期 1992.01.23
申请人 HITACHI LTD 发明人 MORISHITA HAJIME;SUZUKI TETSUO;UTAKA SONOKO;HAYASHI NOBUAKI;ITO MASAHITO;NISHIZAWA SHOKO;NONOGAKI SABURO
分类号 G03F7/012;G03F7/031;G03F7/038;H01J9/227;H01J31/20;H01L21/027 主分类号 G03F7/012
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