| 摘要 |
PURPOSE:To maintain the same stable characteristics as a conventional apparatus using a contact type hot plate while greatly reducing foreign matters adhering to the rear of a substrate. CONSTITUTION:A manufacturing apparatus comprises a hot plate 1 stored in a hermetically sealed chamber 2, an ultraviolet irradiation device 9 for exposing a substrate 6 on the hot plate 1, and a mechanism in which a nitrogen gas with a high purity regulated to the same temperature as the surface of the hot plate 1 is supplied into the sealed chamber 2 through suction vents 10 and an internal air is exhausted from exhaust vents 11. Pillars 5 are installed on the surface of the hot plate 1 and the gap between the rear of the substrate 6 and the surface of the hot plate 1 is maintained to about 100mum. |
