| 摘要 |
PURPOSE:To produce a rare-earth element-added glass film with the thickness and refractive index controlled, to which a large amt. of the rare-earth element is uniformly added and capable of making a high gain and to produce a glass waveguide using the film. CONSTITUTION:Substrates 7a, 7b and 7c and three vapor-deposition sources 3, 4 and 5 are provided in the electron-beam vapor deposition device 1, a tablet 3a of SiO2 is placed in the first source 3, a tablet 4a contg. at least two kinds of refractive index controlling additives in the second source 4 and a tablet 5a contg. at least one kind of rare-earth element in the third source 5, then the tablets 3a, 4a and 5a are irradiated with an electron beam and vaporized, and the vapors are deposited on the substrates 7a, 7b and 7c to form an SiO2 glass film contg. the rare-earth element and at least three kinds of the additives. |
