| 摘要 |
PURPOSE:To provide a photosensitive resin composition excellent in sensitivity, resolution and heat resistance and having large margin of focussing by blending a specific compound as a photosensitive component. CONSTITUTION:Naphthoquinone-1,2-diazide-sulfonic ester is used as a specific aromatic polyhydroxy compound in the photosensitive component. And a compound expressed by the formula is used as an alkali-soluble novolak resin in the photosensitive component. In the formula, at least one of D is naphthoquinone-1,2-diazide-sulfonic group and the other is hydrogen atom and (n) is an integer of 0-7. As the alkali soluble novolak resin, there is no restriction and an alkali soluble type novolak resin such as a bonded compound of aromatic hydroxy compounds such as phenol, cresol or xylenol with aldehydes such as formaldehyde in the presence of an acidic catalyst can be used. |
