| 摘要 |
PURPOSE:To realize a diffraction-limit optical system, for soft X-rays, which is provided with a sufficient reflection factor by forming the following: a base body whose surface roughness is specified; a smoothed layer which is composed of at least one kind of substance layer formed on the surface; and a reflecting- film layer which is formed on the smoothed layer. CONSTITUTION:An aspherical working operation is performed to a solicon carbide(SiC) substrate 0 by using an aspherical cutting and working apparatus. After the working operation, an electrolytic polishing operation is performed as required. Thereby, the spatial period of the surface roughness can be reduced remarkably. Then, a smoothed layer 3 is formed by using a normal-pressure CVD method (a vapor chemical growth method) which uses ozone-doped doped TEOS(tetraethylorthosilicate). After that, an Mo/Si multilayer film 5 is formed on the SiO2 film by using a magnetron sputtering method; a desired mirror is obtained. Thereby, it is possible to realzie a diffraction-limit optical system, for soft X-rays, whose surface roughness is set at about 10Angstrom or lower and which is provided with a sufficient reflection factor. |
