发明名称 POSITIVE RESIST COMPOSITION
摘要 PURPOSE:To obtain a composition having balanced sensitivity, residual film rate, resolution, dimensional controllability, etc., by incorporating an alkali- soluble phenol resin, a quinone diazide sulfonic ester photosensitive agent and a specified monohydroxy compd. CONSTITUTION:The composition contains an alkali-soluble resin, a quinone diazide sulfonic ester photosensitive agent and a monohydroxy compd. shown by the formula. In the formula, R1...R5 are selected from hydrogen atom, halogen atom, 1-8C alkyls and 2-5C alkenyls, X is a single bond, -C(=O)-, -CO-, -C(-R7)(-R8)or -CH2O-, and R7 and R8 are selected from hydrogen atom and 1-4C alkyls. The composition consists preferably of 1000 pts.wt. of the phenol resin, 1-1000 pts.wt. of the photosensitive resin, 1-100 pts.wt. of the compd. and a solvent sufficient to dissolve the components.
申请公布号 JPH05333540(A) 申请公布日期 1993.12.17
申请号 JP19920165345 申请日期 1992.06.01
申请人 NIPPON ZEON CO LTD 发明人 KAWADA MASAJI;KUSUNOKI TETSUAKI;KASHIWAGI MOTOFUMI;FUJII TOSHIAKI
分类号 G03F7/022;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/022
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