| 摘要 |
PURPOSE:To provide a vacuum processing device which is applicable to a wide range of purposes, has a high throughput of processing and can enhance the yield of subjects to be processed. CONSTITUTION:An LCD substrate 10 enclosed in a substrate storage cassette 40 is conveyed by an atmospheric arm unit 42 to a second load lock chamber 30. A second load lock chamber 30 to be evacuated is provided with a positioner 80 and a buffer mechanism 90 and the LCD substrate 10 is held by the buffer mechanism 90 and positioned by the positioner 80 and then conveyed by a substrate conveying arm 60 to the first load lock chamber 20. The deviation of the position of the substrate 10 that could be caused by the flow of gas during evacuation can therefore effectively be prevented. The LCD substrate 10 being held by the buffer mechanism 70 in the first load lock chamber 20 is subjected to etching and ashing, etc., in the first, second and third vacuum processing chambers 12, 14, 16, and then conveyed out of the vacuum processing device and returned to the substrate storage cassette 40. |
