| 摘要 |
PURPOSE:To obtain excellent resistance to plating and to prevent the generation of the scum of development by incorporating specified ethylenic unsatd. compd., org. halogen compd., film-property imparting polymer and a photoinitiator and/or photoinitiators. CONSTITUTION:The photosensitive resin contains at least one ethylenic unsatd. compd. expressed by the formula, org. halogen compd., film-property imparting polymer and photoinitiator which can generate free radical by active ray and/or photoinitiators, and the element consists of the layers of the composition and the supporting body film which supports the layers. In the formula, each of R1 and R4 is hydrogen atom or methyl group independently, each of R2 and R3 is ethylene group or propylene group, but R2 and R3 is inevitably different from each other, if R2 is propylene group, (m)is integer 1-2 and (n) is integer >=1, if R3 is propylene group, (n) is integer 1-2 and (m) is integer >=1. |
