发明名称 SEMICONDUCTOR DEVICE AND MAKING METHOD THEREOF
摘要 Semiconductor device comprising a device isolating region by trenches having the same or different widths on a semiconductor substrate, wherein an active region which is located as an island-shape on the semiconductor substrate having a boundary line with the device isolation region comprises trenches formed with a predetermined width along the outer wall of said trench, planaized insulating layers formed on the inactive region of the substrate between trenches which wrap another active region, spacers formed by an insulating material which fills up trenches, thereby accomplishing a high density semiconductor device.
申请公布号 KR940003223(B1) 申请公布日期 1994.04.16
申请号 KR19910017326 申请日期 1991.10.02
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, YUN - KI;KIM, BYONG - RYOL;KIM, SU - HAN
分类号 H01L21/76;(IPC1-7):H01L21/76 主分类号 H01L21/76
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