发明名称 Method of forming a dielectric layer.
摘要 A method of forming a dielectric layer (19, 21, 22) provides the dielectric layer (19, 21, 22) with a substantially uniform density. A plasma of an activation gas (16) is formed wherein the activation gas plasma is substantially devoid of other gases. The plasma of the activation gas (16) is maintained until the plasma becomes stable. After stabilization is achieved, dielectric formation is initiated by adding a dielectric precursor gas (18) to the plasma of the activation gas thereby forming a plasma of the dielectric precursor gas. <IMAGE>
申请公布号 EP0603477(A1) 申请公布日期 1994.06.29
申请号 EP19930115478 申请日期 1993.09.24
申请人 MOTOROLA, INC. 发明人 EHLERT, ERIC P.;GRIVNA, GORDON;SHIN, HANK HYUN-KYOO
分类号 C30B29/06;C23C16/02;C23C16/40;H01L21/31;H01L21/316;H01L21/46 主分类号 C30B29/06
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