| 摘要 |
PURPOSE: To handle flat objects under an ultraclean atmosphere by holding the flat objects confined in the ultraclean atmosphere inside individual boxes in a special atmosphere only at a place where the box is opened. CONSTITUTION: This system is provided with an interface 5 for performing ventilation shift between a carrying element 3 and working stations 6A and 6B. Then, the flat objects like silicon wafers are constantly confined in the ultraclean atmosphere inside the individual boxes 1, then the boxes 1 are opened inside the interface 5, the flat objects are taken out from the boxes 1 and the articles are held under the ultraclean atmosphere during the entire period of being retained inside the working stations 6A and 6B. Also, the transfer tunnel 4 of the flat objects for rigidly connecting the two work stations 6A and 6B while holding the flat objects under the ultraclean atmosphere and the carriage and transfer of the boxes 1 are operated and controlled and the silicon wafers or the like are handled under the special atmosphere.
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