发明名称 WET CHEMICAL PROCESSING APPARATUS FOR SEMICONDUCTOR WAFER OR THE LIKE
摘要 PURPOSE: To reduce the amount of solvent, etchant, deionized water used in the wet chemical treatment, by using a valve means for joining selectively a first container to an inlet part and a containing means to an outlet part or a second container to the inlet part and the containing means to the outlet part. CONSTITUTION: An inlet conduit tube 66 is joined to a container 18 by operating a valve 42 while toluene flows from the container 18. A space of a cell 50 is filled with the toluene, and an outlet conduit tube 68 is joined to a flow-out solvent storing unit 26. The valve 42 is operated to separate the inlet conduit tube 68 from all the containers and the storing units. The valve 42 is operated, and the inlet conduit tube 66 is joined to the container 18. The toluene flows from the container 18 to the space of the cell 50, and the space is filled with the toluene. The outlet conduit tube 68 is joined to the flow-out solvent containing unit 26. Then, used toluene is fed from the space of the cell 50 to the flow-out solvent containing unit 26. The valve 42 is operated again to keep the separated state.
申请公布号 JPH06208983(A) 申请公布日期 1994.07.26
申请号 JP19930146522 申请日期 1993.06.17
申请人 SANTA BARBARA RES CENTER 发明人 JIERARUDO EE GAAUTSUDO JIYUNIA
分类号 B05C3/109;C23F1/08;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):H01L21/304 主分类号 B05C3/109
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