| 摘要 |
PURPOSE:To provide a positive resist material for high energy beam high in sensitivity and resolution and having excellent process aptitude. CONSTITUTION:The positive resist material contains a poly(hydroxy styrene) resin (a) in which hydrogen atom of a part of hydroxyl group is substituted by t-butoxycarbonyl, a dissolution inhibitor (b) and an onium salt (c) so as to be 0.55<=(a), 0.07<=(b)<=0.40, 0.005<=(c)<=0.15 and (a)+(b)+(c)=1 by wt. percent, is developed with an alkaline aq. solution and is sensitive to high energy beam and the onium salt (c) is expressed by a general formula, (R)2I<+>M. In the formula, R is aromatic group, at least one of Rs is phenyl group substituted by beta- hydroxy ethoxy group and each of Rs can be the same or different. And M is an anion. |
