| 摘要 |
PURPOSE:To provide the compsn. which has high sensitivity to radiation and is efficiently dissolved by a developer only in the exposed parts by consisting the compsn. of high-polymer compds. in which the specific quantity of functional groups for imparting alkaline solubility are replaced with the protective groups decomposed by an acid and specific compds. CONSTITUTION:This resist compsn. consists of at least one kind of the high- polymer comps. in which 5 to 50mol% of the functional groups for imparting alkaline solubility are replaced with the protective groups decomposed by the acid, at least one kind of the compds. which are at least one kind of the compds. expressed by formula I or formula II and are decomposed by the acid to be made soluble in alkali-solution and at least one kind of the compds. which generate the acid by irradiation with radiations. In the formula I, R1, R2 denote hydrogen atom, methyl group, etc.. R3 denotes a methyl group, etc.. X denotes an oxycarbonyl group, etc., Ar denotes a phenylene group, 3.5-dichlorophenylene group, etc. In the formula II, R1, R3, X and Ar are the same as in the case of the formula I and m denotes an integer from 1 to 3. |
