发明名称 ALIGNER
摘要 PURPOSE:To omit a step of masking in a mask by a method wherein a cover for shielding a positioning mark of a mask and a positioning mark of a substrate from alignment at aligning is fixed so as to shield the positioning mark of a mask and the positioning mark of a substrate from aligning beams. CONSTITUTION:A microscope 2 is provided so as t be a symmetrical shape on both right and left sides of a mask 1. However, the right-sided microscope 2 is not shown. A shielding cover 3 is fixed over the microscope 2. This cover 3 at all times interrupts aligning beams 4 emitted from above. Accordingly, a positioning mark 5 of a mask 1 is at all times shielded. In other words, the positioning mark 5 of the mask 1 and a positioning mark 7 of a substrate 6 are interrupted from the aligning beams 4 by both a position at aligning and a position at mark positioning.
申请公布号 JPH06244074(A) 申请公布日期 1994.09.02
申请号 JP19930047109 申请日期 1993.02.15
申请人 TOPCON CORP 发明人 SUZUKI KIYOBUMI;SHIMIZU MASAKI
分类号 G03B27/02;G03B27/32;G03F7/20;G03F9/00;H01L21/027;H05K3/00;(IPC1-7):H01L21/027 主分类号 G03B27/02
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